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For cleaning chemical vapor deposition chambers.

Chlorine trifluoride (ClF₃) is one of the most dangerously reactive and hazardous substances known to chemistry. It is a powerful oxidizing agent that can cause almost any organic material and many inorganic materials—including glass, sand, and asbestos—to ignite spontaneously on contact.

Information regarding the safe handling, emergency response, and regulatory requirements for such materials can be found through official government safety databases and industrial hygiene resources.